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Open call for Exhibitions Abroad Support Program for the 2019 - 2020 fiscal year is now closed. Please check back for further information in the fall of 2019.



This program is designed to provide financial support for museums and art institutions outside of Japan that organize exhibitions introducing Japanese art and culture. International exhibitions such as biennials and triennials introducing Japanese artists and their works are also applicable.


For exhibitions originating in the following 37 states east of the Rocky Mountains and open on or between April 1, 2019 and March 31, 2020, applications are to be submitted to the New York office by the deadline indicated in Application Deadline section below:

Northeast: CT, DE, ME, MD, MA, NH, NJ, NY, PA, RI, VT
South: AL, AR, DC, FL, GA, KY, LA, MS, NC, OK, SC, TN, TX, VA, WV
Midwest: IL, IN, IA, KS, MI, MN, MO, NE, ND, OH, SD, WI

For other states, please visit our Los Angeles office website.


Click on the following link for further information including eligibility, grant coverage, review criteria as well as the application form:

2019-2020 Exhibitions Abroad Support Program Instruction and Application Form


Application Deadline

TWO sets of applications (one original, one copy) must be received by mail or hand delivery (facsimile transmission or email will not be accepted) by 5:00 p.m. EST, December 3, 2018 at:

Attn: Exhibitions Abroad Support Program
The Japan Foundation, New York
1700 Broadway, 15th Floor
New York, NY 10019


Notification of Results

Written notification of awards will be mailed in late April 2019.


List of Past Awardees







For more information, please email info@jfny.org or call 212-489-0299.


Banner image:
Detail of installation view of "Provoke: Photography in Japan between Protest and Performance, 1960-1975"
at The Art Institute of Chicago, January 28-April 30, 2017. Photography courtesy of the Art Institute of Chicago.
Work shown:
Takuma Nakahira, For a Language to Come, 1970 (detail), Published by Fudosha, Tokyo, reproduction published in 2001 by Steidl Verlag, Halftone offset lithograph

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